The VaporPulse ALD MINI CHAMBER was designed for ALD R&D

100mm MINI CHAMBER Installed in Customer R&D Lab

• Our process  for success: We define your specification and design the equipment around it.
• Our clients are some of the biggest research organizations in the world.
• We have worked with leading University and Corporate R&D labs to deliver solutions for successful ALD research.
• We believe the quicker you test, the quicker you’ll succeed.

 MINI CHAMBER Overview:

• A low cost solution for ALD/CVD R&D.
• Based on more than 75 years of semiconductor process and equipment design experience.
• Our skilled team holds over 50 US patents  and designed chambers for leading semiconductor manufacturers.
  

  MINI CHAMBER ALD SYSTEM for 100mm Substrates (up 300mm capability)

MINI CHAMBER Benefits:

• Cost effective R&D ALD/CVD bench system
• Designed for rapid ALD research
• Ideal for university and corporate labs

MINI CHAMBER System Features:

• 100mm hot wall vacuum chamber
• Temperature controlled substrate stage (350C)
• 2 organometallic precursor lines
• 2 co-reactants (H2O, O3, NH3)
• PC-based control system w/ loaded recipes
• Heated precursor delivery system
• Oil sealed rotary vane vacuum pump
  

  MINI CHAMBER with Plasma

MINI CHAMBER Optional Features:

• 300mm capability
• High temperature stage (up to 600C)
• Plasma source
• Vented enclosure
• Custom precursor delivery system
• Low-volatility precursors,organics
• Additional precursor feed lines
• Dry pump
• On-site training and service agreements

MINI CHAMBER – Designed for ALD

• To learn more about the VaporPulse ALD MINI CHAMBER, please email Chris Oldham at cjoldham@vapor-pulse.com or connect with us here.